The Yaws Handbook of Vapor Pressure

Antoine Coefficients

Author: Carl L. Yaws

Publisher: Gulf Professional Publishing

ISBN: 012803002X

Category: Technology & Engineering

Page: 336

View: 7635

Increased to include over 25,000 organic and inorganic compounds, The Yaws Handbook of Vapor Pressure: Antoine Coefficients, 2nd Edition delivers the most comprehensive and practical database source for today's petrochemical. Understanding antoine coefficients for vapor pressure leads to numerous critical engineering applications such as pure components in storage vessels, pressure relief valve design, flammability limits at the refinery, as well as environmental emissions from exposed liquids, making data to efficiently calculate these daily challenges a fundamental need. Written by the world’s leading authority on chemical and petrochemical data, The Yaws Handbook of Vapor Pressure simplifies the guesswork for the engineer and reinforces the credibility of the engineer’s calculations with a single trust-worthy source. This data book is a must-have for the engineer’s library bookshelf. Increase compound coverage from 8,200 to over 25,000 organic and inorganic compounds, including sulfur and hydrocarbons Solve process design questions quickly from a single reliable data source Locate answers easily for multiple petrochemical related questions such as bubble point, dew point temperatures, and vapor-liquid equilibrium

Chemical Vapor Deposition

Proceedings of the Fourteenth International Conference and EUROCVD-11

Author: Mark Donald Allendorf,Claude Bernard

Publisher: The Electrochemical Society

ISBN: 9781566771788

Category: Ceramic materials

Page: 1652

View: 4958


Principles of Vapor Deposition of Thin Films

Author: Professor K.S. K.S Sree Harsha

Publisher: Elsevier

ISBN: 9780080480312

Category: Technology & Engineering

Page: 1176

View: 7989

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Handbook of Physical Vapor Deposition (PVD) Processing

Author: D. M. Mattox

Publisher: Cambridge University Press

ISBN: 9780080946580

Category: Technology & Engineering

Page: 944

View: 8409

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories,"" to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Vapor-Liquid Interfaces, Bubbles and Droplets

Fundamentals and Applications

Author: Shigeo Fujikawa,Takeru Yano,Masao Watanabe

Publisher: Springer Science & Business Media

ISBN: 9783642180385

Category: Technology & Engineering

Page: 230

View: 3502

Physically correct boundary conditions on vapor-liquid interfaces are essential in order to make an analysis of flows of a liquid including bubbles or of a gas including droplets. Suitable boundary conditions do not exist at the present time. This book is concerned with the kinetic boundary condition for both the plane and curved vapor-liquid interfaces, and the fluid dynamics boundary condition for Navier-Stokes(fluid dynamics) equations. The kinetic boundary condition is formulated on the basis of molecular dynamics simulations and the fluid dynamics boundary condition is derived by a perturbation analysis of Gaussian-BGK Boltzmann equation applicable to polyatomic gases. The fluid dynamics boundary condition is applied to actual flow problems of bubbles in a liquid and droplets in a gas.

Modeling Vapor-Liquid Equilibria

Cubic Equations of State and Their Mixing Rules

Author: Hasan Orbey,Stanley I. Sandler

Publisher: Cambridge University Press

ISBN: 9780521620277

Category: Technology & Engineering

Page: 207

View: 6122

Reviews the latest developments in a subject relevant to professionals involved in the simulation and design of chemical processes - includes disk of computer programs.

Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV

Proceedings of the Internatioal Symposium

Author: Electrochemical Society. High Temperature Materials Division,Electrochemical Society. Dielectric Science and Technology Division

Publisher: The Electrochemical Society

ISBN: 9781566773195

Category: Chemical vapor deposition

Page: 508

View: 8875


Water Vapor Measurement

Methods and Instrumentation

Author: Pieter R. Wiederhold

Publisher: CRC Press

ISBN: 9780824793197

Category: Science

Page: 384

View: 9507

Offering all aspects of humidity measurement and instrumentation, this work includes rudiments and theory, common applications, advantages and limitations of frequently-used sensors and techniques, and guidelines for installation, maintenance and calibration. The disk is intended for easy conversions of humidity parameters and units.

Soil Vapor Extraction Using Radio Frequency Heating

Resource Manual and Technology Demonstration

Author: Donald F. Lowe,Carroll L. Oubre,C. H. Ward

Publisher: CRC Press

ISBN: 9781566704649

Category: Science

Page: 360

View: 4690

One of the most widely used techniques for treating soils contaminated with volatile organic compounds, soil vapor extraction (SVE) can also be applied to semi-volatile organic compounds (SVOCs) if the soil is heated, by applying electromagnetic energy in the radio frequency (FR) range, to increase the vapor pressure of the contaminants. Although RF-SVE systems used in previous field demonstrations have had varying degrees of success, questions remain concerning its viability and cost-effectiveness. Soil Vapor Extraction Using Radio Frequency Heating: Resource Manual and Technology Demonstration covers detailed scientific and engineering information that answers these questions. The book includes the necessary databases, equations, and example calculations for RF heating. The theoretical and practical information included will facilitate future testing of RF-SVE treatment of soils. Additionally, the book provides information for a full-scale engineering design of potential RF-SVE applications. The authors use this information to examine predicted performance, magnitude of costs, and modifications to the design that may decrease cost. Soil Vapor Extraction Using Radio Frequency Heating: Resource Manual and Technology Demonstration gives an economic analysis of this innovative technology and considers other possible applications for it. Features

Chemical Vapor Deposition Polymerization

The Growth and Properties of Parylene Thin Films

Author: Jeffrey B. Fortin,Toh-Ming Lu

Publisher: Springer Science & Business Media

ISBN: 9781402076886

Category: Science

Page: 102

View: 1114

Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

Atmospheric Water Vapor

Author: Adarsh Deepak,Thomas D. Wilkerson,Lothar H. Ruhnke

Publisher: Elsevier

ISBN: 1483273342

Category: Science

Page: 212

View: 9366

Atmospheric Water Vapor contains the technical proceedings of the International Workshop on Atmospheric Water Vapor held in Vail, Colorado, on September 11-13, 1979. The papers assess the state-of-the-art in measurement, modeling, and application of atmospheric water vapor properties and highlight important problems that require further effort in order to better understand the atmosphere itself as well as the electromagnetic propagation through the atmosphere. Comprised of 39 chapters, this book begins with a discussion on the optics and spectroscopy of water vapor. Some actual spectra showing the problems specific to the water molecule are described, along with the method used to calculate precise vibration-rotation energy levels and wave functions. Atmospheric infrared transmission measurements in maritime locations are also presented. Subsequent sections explore microwave and millimeter wave phenomena; geoastrophysical applications; and in situ measurements, remote sensing, and meteorology of water vapor. The final chapters deal with the microphysics and atmospheric chemistry of water vapor. This monograph will be of interest to scientists from universities, government agencies, research laboratories, and industry.

Luminous Chemical Vapor Deposition and Interface Engineering

Author: Hirotsugu Yasuda

Publisher: CRC Press

ISBN: 1420030299

Category: Science

Page: 840

View: 4958

Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science. The book comprises four parts. Part 1 describes the fundamental difference between glow discharge of an inert gas and that of an organic vapor, from which the concepts of Luminous Gas Phase derive. Part 2 explores the various ways of practicing Luminous Vapor Disposition and Treatment depending on the type and nature of substrates. Part 3 covers some very important aspects of surface and interface that could not have been seen clearly without results obtained by application of LCVD. Part 4 offers some examples of interface engineering that show very unique aspects of LCVD interface engineering in composite materials, biomaterial surface and corrosion protection by the environmentally benign process. Timely and up-to-date, the book provides broad coverage of the complex relationships involved in the interface between a gas/solid, liquid/solid, and a solid/solid. The author presents a new perspective on low-pressure plasma and describes key aspects of the surface and interface that could not be shown without the results obtained by LCVD technologies. Features Provides broad coverage of complex relationships involved in interface between a gas/solid, a liquid/solid, and a solid/solid Addresses the importance of the initial step of creating electrical glow discharge Describes the principles of creating chemically reactive species and their growth in the luminous gas phase Focuses on the nature of surface-state of solid and on the creation of imperturbable surface-state by the contacting phase or environment, which is vitally important in creating biocompatible surface, providing super corrosion protection of metals by environmentally benign processes, etc. Offers examples on how to use LCVD in the interface engineering process Presents a new view on low-pressure (low-temperature) plasma and emphasizes the importance of luminous gas phase and chemical reactions that occur in the phase About the author: Dr. Yasuda is one of the pioneers who explored low-pressure plasma for surface modification of materials and deposition of nano films as barrier and perm-selective membranes in the late 1960s. He obtained his PhD in physical and polymer chemistry working on transport properties of gases and vapors in polymers at State University of New York, College of Environmental Science and Forestry at Syracuse, NY. He has over 300 publications in refereed journals and books, and is currently a Professor Emeritus of Chemical Engineering, and Director, Center for Surface Science & Plasma Technology, University of Missouri-Columbia, and is actively engaged in research on the subjects covered by this book.