Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques

Author: Rajiv Kohli,K.L. Mittal

Publisher: Elsevier

ISBN: 0128155787

Category: Technology & Engineering

Page: 830

View: 2742

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries Serves as a guide to the selection of precision cleaning techniques for specific applications

Developments in Surface Contamination and Cleaning, Volume 7

Cleanliness Validation and Verification

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 0323311458

Category: Technology & Engineering

Page: 206

View: 1658

As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects

Developments in Surface Contamination and Cleaning

Contaminant Removal and Monitoring

Author: Rajiv Kohli

Publisher: William Andrew

ISBN: 143777881X

Category: Science

Page: 240

View: 9743

In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Feature: Comprehensive coverage of innovations in surface contamination and cleaning Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning problem, saving the time involved in consulting a range of disparate sources. Feature: Written by established experts in the contamination and cleaning field Benefit: Provides an authoritative resource Feature: Each chapter is a comprehensive review of the state of the art. Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute innovations. Feature: Case studies included Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning and contamination problems.

Developments in Surface Contamination and Cleaning, Vol. 1

Fundamentals and Applied Aspects

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 0323312705

Category: Science

Page: 894

View: 8093

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field

Developments in Surface Contamination and Cleaning: Types of Contamination and Contamination Resources

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 0323431739

Category: Technology & Engineering

Page: 192

View: 9343

Developments in Surface Contamination and Cleaning, Volume Ten, provides a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their cleaning methods. This newest volume in the series discusses mechanisms of particle adhesion, particle behavior in liquid systems, and metallic contamination and its impact. In addition, the book includes a discussion of the types of contaminants, with resources to deal with them and information on environmental issues related to surface contamination and cleaning. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning that also includes information on cleaning at the micro and nano scales. Written by established experts in the contamination field that provide an authoritative resource Presents a comprehensive review of new trends in contaminants and resources for dealing with those contaminants Contains detailed case studies to illustrate various scenarios

Developments in Surface Contamination and Cleaning, Volume 8

Cleaning Techniques

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 0323312713

Category: Technology & Engineering

Page: 234

View: 9039

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Covers novel wet and dry surface cleaning methods of increasing commercial importance

Developments in Surface Contamination and Cleaning - Fundamentals and Applied Aspects

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: Elsevier

ISBN: 0815516851

Category: Science

Page: 1200

View: 6536

Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated. • Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical. • A single source document addressing everything from the sources of contamination to their removal and prevention. • Amply referenced and profusely illustrated.

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 0323431720

Category: Technology & Engineering

Page: 212

View: 9672

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods. This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales. Provides a comprehensive coverage of innovations in surface cleaning Written by established experts in the surface cleaning field, presenting an authoritative resource Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process

Developments in Surface Contamination and Cleaning, Volume 4

Detection, Characterization, and Analysis of Contaminants

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 1437778844

Category: Science

Page: 352

View: 4596

In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Comprehensive coverage of innovations in surface contamination and cleaning Written by established experts in the contamination and cleaning field Each chapter is a comprehensive review of the state of the art Case studies included

Developments in Surface Contamination and Cleaning - Vol 2

Particle Deposition, Control and Removal

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 9781437778304

Category: Science

Page: 312

View: 6562

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning

Developments in Surface Contamination and Cleaning, Volume 12

Methods for Assessment and Verification of Cleanliness of Surfaces and Characterization of Surface Contaminants

Author: Rajiv Kohli,K.L. Mittal

Publisher: Elsevier

ISBN: 9780128160817

Category: Technology & Engineering

Page: 316

View: 7478

Developments in Surface Contamination and Cleaning: Methods for Assessment and Verification of Surface Cleanliness, Volume 12, part of the Developments in Surface Contamination and Cleaning series, provides a guide to the current knowledge for determining surface cleanliness. It is a unique source of information for the assessment and verification methods compiled into a single reference. The book begins with an introduction to the nature and size of particles and a discussion of cleanliness levels. This is followed by detailed coverage of measurement methods, characterization methods and analytical methods for evaluating surfaces. The book concludes with an overview of analysis methods for various contaminants. As a whole, the series creates a unique and comprehensive knowledge base of crucial importance to those in research and development, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defence, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books Includes an extensive listing with description of available methods for assessment of surface cleanliness Provides a single source of information on methods for verification of surface cleanliness Serves as a guide to selection of assessment and verification methods for specific applications

Analytische Transmissionselektronenmikroskopie

Eine Einführung für den Praktiker

Author: Jürgen Thomas,Thomas Gemming

Publisher: Springer-Verlag

ISBN: 3709114403

Category: Science

Page: 363

View: 6519

Die Autoren des Buches fassen ihre im Zuge vielseitiger Lehrtätigkeit gesammelten Erfahrungen zu häufig gestellten Fragen und Problemen von Anfängern im Umgang mit dem analytischen Transmissionselektronenmikroskop anschaulich zusammen. Dabei bilden Erklärungen anhand einfacher Modellvorstellungen und Hinweise zur praktischen Umsetzung des Erlernten die Schwerpunkte des Buches. Dieses praxisnahe Lehrbuch bietet somit eine klare und verständliche Einführung für all jene, die für Ihre Arbeit das Transmissionselektronenmikroskop verwenden wollen, jedoch noch nicht speziell dafür ausgebildet sind.

Laser Cleaning II

Author: D. M. Kane

Publisher: World Scientific

ISBN: 9812706844

Category: Technology & Engineering

Page: 289

View: 8106

Laser Cleaning II is the second of a series of books reporting research on the use of lasers for cleaning material surfaces and related micro-scale and nano-scale laser processing. It follows Laser Cleaning, edited by Boris LukOCOyanchuk, published in 2002. The primary focus is on contaminant particle removal, nano-scale sized particles in particular, which represents a major cleaning challenge in industrial contexts and poses a broad range of research questions. The contributions provide stimulating answers to these questions, spanning the essential areas: the fundamental theoretical and experimental physics of light/particle/interface interactions, invention and development of laser cleaning techniques and diagnostics, simulations for important material and process systems, and laser cleaning and processing applications. Laser cleaning for art and cultural heritage conservation is a related, mature field of research which is also treated."

International Trends in Applied Optics

Author: Arthur Henry Guenther

Publisher: SPIE Press

ISBN: 9780819445100

Category: Technology & Engineering

Page: 697

View: 9354

This volume represents the fifth in a series of books, 'International Trends in Optics', which was initiated in 1989 by the International Commission for Optics (ICO). These books highlight the advances and focus areas in the field of optics at the time of their publication. The reader will find a collection of significant contributions from leading scientists and engineers throughout the world, that show the range and diversity optics plays in modern societies.

Advances in Blood Research and Application: 2011 Edition

Author: N.A

Publisher: ScholarlyEditions

ISBN: 1464921903

Category: Medical

Page: 426

View: 6450

Advances in Blood Research and Application / 2011 Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Blood. The editors have built Advances in Blood Research and Application: 2011 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Blood in this eBook to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Advances in Blood Research and Application: 2011 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.

Lebenslinien

Eine Selbstbiographie

Author: Wilhelm Ostwald

Publisher: BoD – Books on Demand

ISBN: 384302233X

Category: Fiction

Page: 808

View: 3079

Wilhelm Ostwald: Lebenslinien. Eine Selbstbiographie Erstdruck: Berlin (Klasing) 1926/1927. Vollständige Neuausgabe. Herausgegeben von Karl-Maria Guth. Berlin 2013. Textgrundlage ist die Ausgabe: Ostwald, Wilhelm: Lebenslinien. Eine Selbstbiographie, 3 Teile, Berlin: Klasing, 1926/1927. Die Paginierung obiger Ausgabe wird in dieser Neuausgabe als Marginalie zeilengenau mitgeführt. Umschlaggestaltung von Thomas Schultz-Overhage unter Verwendung des Bildes: Wilhelm Ostwald (1903). Gesetzt aus Minion Pro, 11 pt. Über den Autor: Neben dessen Gründer Ernst Haeckel war der Freimaurer und Chemie-Nobelpreisträger Wilhelm Ostwald einer der führenden Köpfe des Deutschen Monistenbundes, der eine wissenschaftlich begründbare Weltanschauung nach dem Prinzip der Einheit von Natur und Geist vertrat und dabei christlicher Dogmatik widersprach. Er schlug unter dem Namen »Weltdeutsch« ein vereinfachtes Deutsch als internationale Plansprache vor und setzte sich für ein Weltgeld ein. Nach Differenzen mit der Universität Leipzig legte er seinen Lehrstuhl nieder und lebte als Privatforscher bis zu seinem Lebensende 1932 auf seinem Landsitz in Großbothen.

Handbook of Silicon Wafer Cleaning Technology

Author: Karen Reinhardt,Werner Kern

Publisher: William Andrew

ISBN: 032351085X

Category: Technology & Engineering

Page: 760

View: 2829

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process